Dept Of Defense- Defense Health Agency ( Dha)- Army Med Res Acq Activity
Photolithography Exposure System - The U. S. Army Medical Research Institute of Chemical Defense ( USAMICD) requires a photolithography exposure system which could be a mask aligner or a direct laser writer ( also known as a & ldquo; maskless& rdquo; aligner). It shall have a UV light so
**** specialized semiconductor, microcircuit, and printed circuit board manufacturing machinery specialized semiconductor, microcircuit, and printed circuit board manufacturing machinery this class includes, and is restricted to, equipment specifically designed for manufacturing semiconductor devices fsc ****, microcircuits fsc ****, and printed circuit boards fsc **** items for which more suitable classes are specifically prescribed by the indexes and structure of the fsc. the u. s. army medical research institute of chemical defense usamicd requires a photolithography exposure system which could be a mask aligner or a direct laser writer also known as a maskless aligner. it shall have a uv light source that passes light through an inserted photomask onto a substrate coated in photoresist. the system shall be able to align this projected pattern precisely with the substrate being exposed. the uv light wavelength shall be compatible with su 8 photoresist 365nm. operating parameters shall be digitall